Детальная информация

Название: Handbook of chemical vapor deposition: principles, technology and applications. — 2nd ed.
Авторы: Pierson Hugh O.
Выходные сведения: Amsterdam [etc.]: Elsevier Inc., William Andrew, 1999
Коллекция: Электронные книги зарубежных издательств; Общая коллекция
Тематика: Осаждение (хим. ); Пар
УДК: 542.65
Язык: Английский
Права доступа: Доступ из локальной сети ФБ СПбПУ (чтение, печать, копирование)

Разрешенные действия: Посмотреть

Аннотация

Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.

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