Details
| Title | Sputtering materials for VLSI and thin film devices |
|---|---|
| Creators | Sarkar Jaydeep |
| Imprint | Amsterdam [etc.]: Elsevier Inc., William Andrew, 2011 |
| Collection | Электронные книги зарубежных издательств; Общая коллекция |
| Subjects | Микроэлектроника; Пленки тонкие — Получение; Дисплеи |
| UDC | 539.23; 004.353; 621.38 |
| Document type | Other |
| File type | Other |
| Language | English |
| Rights | Доступ из локальной сети ФБ СПбПУ (чтение, печать, копирование) |
| Record key | RU\SPSTU\edoc\52719 |
| Record create date | 4/27/2018 |
An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Two unique chapters of this book deal with productivity and troubleshooting issues.
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