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Annotation
В данной работе проведено получение слоев оксида железа на подложке из оксида кремния путем атомно-слоевого осаждения (АСО). Методом рентгеновской фотоэлектронной спектроскопии (РФС) определено химическое состояние атомов в образце. Проведен анализ изменения химического состояния по толщине слоев и оценена толщина слоев. Проведено сравнение характеристик образцов – после осаждения и обожженных.
In this work, iron oxide layers were obtained on a silicon oxide substrate by atomic layer deposition (ALD). The chemical state of each atom in the sample was determined by X-ray photoelectron spectroscopy (XPS). The analysis of changes in the chemical state with respect to the thickness of the layers and the increase in thickness was carried out. The characteristics of heated and unheated samples are compared.
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