Details
| Title | Handbook of deposition technologies for films and coatings: science, applications and technology. — 3rd ed. |
|---|---|
| Other creators | Martin Peter M. |
| Imprint | Amsterdam [etc.]: Elsevier Inc., William Andrew, 2010 |
| Collection | Электронные книги зарубежных издательств; Общая коллекция |
| Subjects | Пленки тонкие — Получение |
| UDC | 539.23(035) |
| Document type | Other |
| File type | Other |
| Language | English |
| Rights | Доступ из локальной сети ФБ СПбПУ (чтение, печать, копирование) |
| Record key | RU\SPSTU\edoc\52656 |
| Record create date | 4/24/2018 |
This 3rd, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.
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